Characterization of nanocrystalline indium tin oxide thin films prepared by ion beam sputter deposition method

Engineering & Materials Science

• Sputter deposition 100%
• Ion beams 86%
• Tin oxides 84%
• Indium 79%
• Oxide films 75%
• Thin films 57%
• Flow rate 45%
• Opacity 23%
• Diffraction patterns 17%
• Film thickness 13%
• X ray diffraction 11%
• Oxygen vacancies 9%
• Sheet resistance 8%
• Argon 6%
• Annealing 6%
• Oxygen 4%
• Glass 4%
• Substrates 4%

Physics & Astronomy

• indium oxides 60%
• tin oxides 58%
• flow velocity 48%
• ion beams 47%
• oxide films 43%
• characterization 33%
• thin films 31%
• transmittance 15%
• diffraction patterns 10%
• film thickness 9%
• oxygen 7%
• x rays 5%
• argon 4%
• grain size 4%
• annealing 3%
• glass 3%

Chemical Compounds

• Sputter Deposition 87%
• Ion Beam 67%
• Flow Kinetics 42%
• Liquid Film 29%
• Transmittance 16%
• Resistance 7%
• Sheet Resistance 6%
• X-Ray Diffraction 5%
• Glass Substrate 5%
• Dioxygen 5%
• Grain Size 5%
• Annealing 4%
• Time 1%