Construction and application of a UHV compatible cluster deposition system

René Reichel, Jim G. Partridge, Alan D.F. Dunbar, Simon A. Brown, Owen Caughley, Ahmad Ayesh

Research output: Contribution to journalArticlepeer-review

38 Citations (Scopus)


The design and operation of a new UHV-compatible atomic cluster deposition system is described. The design is optimised for high cluster fluxes and for the production of cluster-assembled nano-devices. One key feature of the system is a high degree of flexibility, including interchangeable sputtering and inert gas aggregation sources, and two kinds of mass spectrometer, which allow both characterisation of the cluster size distribution and deposition of mass-selected clusters. Another key feature is that clusters are deposited onto electrically contacted lithographically defined devices mounted on an UHV-compatible cryostat cold finger, allowing deposition at room temperature as well as cryogenic and elevated temperatures. In-situ electrical characterisation of cluster-assembled devices can then be performed in the temperature range 1.2 - 75 K.

Original languageEnglish
Pages (from-to)405-416
Number of pages12
JournalJournal of Nanoparticle Research
Issue number3-4
Publication statusPublished - Aug 2006
Externally publishedYes


  • Aerosols
  • Cryostat measurements
  • Mass-selection
  • Nanoscale atomic clusters
  • TOF
  • Top-down and bottom-up process
  • UHV

ASJC Scopus subject areas

  • Bioengineering
  • General Chemistry
  • Atomic and Molecular Physics, and Optics
  • Modelling and Simulation
  • General Materials Science
  • Condensed Matter Physics


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