TY - GEN
T1 - Cost effective maskless lithography
T2 - 2018 Advances in Science and Engineering Technology International Conferences, ASET 2018
AU - Ziauddin, Mohammed
AU - Mourad, Abdel Hamid I.
AU - Khashan, Saud A.
N1 - Publisher Copyright:
© 2018 IEEE.
PY - 2018/6/8
Y1 - 2018/6/8
N2 - Maskless lithography has improved manufacturing process of microstructures with time, cost, and flexibility of producing complex designs. It has dramatically overcome the shortcomings of traditional or conventional lithography technique that utilizes masks for patterning. However, commercially available maskless lithography systems are highly expensive for small institutions that uses the system for small production or research purposes. Among the cost-effective methods, direct laser writing and digital micro-mirror device based aerial imaging have been noticed widely in literature. In this study, as a part of manufacturing microfluidic devices, maskless lithography system was developed and built in the lab with cost-effective measures. Some of the results obtained manufacturing complex shapes are provided in this study.
AB - Maskless lithography has improved manufacturing process of microstructures with time, cost, and flexibility of producing complex designs. It has dramatically overcome the shortcomings of traditional or conventional lithography technique that utilizes masks for patterning. However, commercially available maskless lithography systems are highly expensive for small institutions that uses the system for small production or research purposes. Among the cost-effective methods, direct laser writing and digital micro-mirror device based aerial imaging have been noticed widely in literature. In this study, as a part of manufacturing microfluidic devices, maskless lithography system was developed and built in the lab with cost-effective measures. Some of the results obtained manufacturing complex shapes are provided in this study.
KW - Continuous Wave Laser
KW - Direct Laser Writing
KW - Maskless Lithography
KW - Microstructures
KW - Photoresist Material
UR - http://www.scopus.com/inward/record.url?scp=85049961228&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85049961228&partnerID=8YFLogxK
U2 - 10.1109/ICASET.2018.8376878
DO - 10.1109/ICASET.2018.8376878
M3 - Conference contribution
AN - SCOPUS:85049961228
T3 - 2018 Advances in Science and Engineering Technology International Conferences, ASET 2018
SP - 1
EP - 3
BT - 2018 Advances in Science and Engineering Technology International Conferences, ASET 2018
PB - Institute of Electrical and Electronics Engineers Inc.
Y2 - 6 February 2018 through 5 April 2018
ER -