Efficient coupler between silicon photonic and metal-insulator-silicon- metal plasmonic waveguides

A. Emboras; R. M. Briggs; A. Najar; S. Nambiar; C. Delacour; Ph Grosse; E. Augendre; J. M. Fedeli; B. De Salvo; H. A. Atwater; R. Espiau De Lamaestre

doi:10.1063/1.4772941

Efficient coupler between silicon photonic and metal-insulator-silicon- metal plasmonic waveguides

A. Emboras, R. M. Briggs, A. Najar, S. Nambiar, C. Delacour, Ph Grosse, E. Augendre, J. M. Fedeli, B. De Salvo, H. A. Atwater, R. Espiau De Lamaestre

Research output: Contribution to journal › Article › peer-review

24 Citations (Scopus)

Abstract

We report the experimental realization of a compact, efficient coupler between silicon waveguides and vertical metal-insulator-silicon-metal (MISM) plasmonic waveguides. Devices were fabricated using complementary metal-oxide-silicon technology processes, with copper layers that support low-loss plasmonic modes in the MISM structures at a wavelength of 1550 nm. By implementing a short (0.5 μm) optimized metal-insulator-silicon-insulator structure inserted between the photonic and plasmonic waveguide sections, we demonstrate experimental coupling loss of 2.5 dB, despite the high optical confinement of the MISM mode and mismatch with the silicon waveguide mode.

Original language	English
Article number	251117
Journal	Applied Physics Letters
Volume	101
Issue number	25
DOIs	https://doi.org/10.1063/1.4772941
Publication status	Published - Dec 17 2012
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.4772941

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title = "Efficient coupler between silicon photonic and metal-insulator-silicon- metal plasmonic waveguides",

abstract = "We report the experimental realization of a compact, efficient coupler between silicon waveguides and vertical metal-insulator-silicon-metal (MISM) plasmonic waveguides. Devices were fabricated using complementary metal-oxide-silicon technology processes, with copper layers that support low-loss plasmonic modes in the MISM structures at a wavelength of 1550 nm. By implementing a short (0.5 μm) optimized metal-insulator-silicon-insulator structure inserted between the photonic and plasmonic waveguide sections, we demonstrate experimental coupling loss of 2.5 dB, despite the high optical confinement of the MISM mode and mismatch with the silicon waveguide mode.",

author = "A. Emboras and Briggs, {R. M.} and A. Najar and S. Nambiar and C. Delacour and Ph Grosse and E. Augendre and Fedeli, {J. M.} and {De Salvo}, B. and Atwater, {H. A.} and {Espiau De Lamaestre}, R.",

note = "Funding Information: This work has been supported by the French National Agency (ANR) through LETI Carnot Funding. We acknowledge the LETI CMOS platform team for assistance in sample fabrication and K. Gilbert for technical contribution to the optical experiments.",

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AU - Emboras, A.

AU - Briggs, R. M.

AU - Najar, A.

AU - Nambiar, S.

AU - Delacour, C.

AU - Grosse, Ph

AU - Augendre, E.

AU - Fedeli, J. M.

AU - De Salvo, B.

AU - Atwater, H. A.

AU - Espiau De Lamaestre, R.

N1 - Funding Information: This work has been supported by the French National Agency (ANR) through LETI Carnot Funding. We acknowledge the LETI CMOS platform team for assistance in sample fabrication and K. Gilbert for technical contribution to the optical experiments.

PY - 2012/12/17

Y1 - 2012/12/17

N2 - We report the experimental realization of a compact, efficient coupler between silicon waveguides and vertical metal-insulator-silicon-metal (MISM) plasmonic waveguides. Devices were fabricated using complementary metal-oxide-silicon technology processes, with copper layers that support low-loss plasmonic modes in the MISM structures at a wavelength of 1550 nm. By implementing a short (0.5 μm) optimized metal-insulator-silicon-insulator structure inserted between the photonic and plasmonic waveguide sections, we demonstrate experimental coupling loss of 2.5 dB, despite the high optical confinement of the MISM mode and mismatch with the silicon waveguide mode.

AB - We report the experimental realization of a compact, efficient coupler between silicon waveguides and vertical metal-insulator-silicon-metal (MISM) plasmonic waveguides. Devices were fabricated using complementary metal-oxide-silicon technology processes, with copper layers that support low-loss plasmonic modes in the MISM structures at a wavelength of 1550 nm. By implementing a short (0.5 μm) optimized metal-insulator-silicon-insulator structure inserted between the photonic and plasmonic waveguide sections, we demonstrate experimental coupling loss of 2.5 dB, despite the high optical confinement of the MISM mode and mismatch with the silicon waveguide mode.

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Efficient coupler between silicon photonic and metal-insulator-silicon- metal plasmonic waveguides

Abstract

ASJC Scopus subject areas

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