Enhanced photostability of polyvinyl chloride films through antipyrine derivatives: a comprehensive study on UV resistance and degradation inhibition

Safaa Mohamed, Emad Yousif, Mohammed Kadhom, Muna Bufaroosha

Research output: Contribution to journalArticlepeer-review

Abstract

Almost all fabricated polymers need high stabilization to prevent harmful effects. Adding specialized chemicals that rule as light stabilizers (or UV stabilizers) and tailor to the resin's characteristics might accomplish the desired stability. In this work, five antipyrine derivatives were synthesized by the Schiff bases using five benzaldehyde substituents (benzaldehyde, 4-bromobenzaldehyde, 4-nitrobenzaldehyde, 4-dimethylaminobenzaldehyde, and 4-hydroxybenzaldehyde) with 4-aminoantipyrene. The produced complexes are characterized using hydrogen-1 and carbon-13 nuclear magnetic resonance (1H-NMR and 13C-NMR, respectively) and Fourier-transform infrared (FTIR) spectroscopy; then they are filled with polyvinyl chloride (PVC) films. Further techniques are used to study the effects of long-term radiation exposure on these films. The IR spectra of PVC films showed side products containing polyene and carbonyl groups before, during, and after irradiation. The presence of antipyrine derivatives led to a decrease in the intensity of their associated functional groups. Furthermore, it is shown that films with antipyrine compounds performed lower weight loss when exposed to radiation compared with the virgin film. Graphical abstract: (Figure presented.).

Original languageEnglish
JournalMacromolecular Research
DOIs
Publication statusAccepted/In press - 2024

Keywords

  • Antipyrines
  • Modified polymers
  • Photostabilizers
  • Poly(vinyl chloride)
  • Thin films
  • UV resistance

ASJC Scopus subject areas

  • General Chemical Engineering
  • Organic Chemistry
  • Polymers and Plastics
  • Materials Chemistry

Fingerprint

Dive into the research topics of 'Enhanced photostability of polyvinyl chloride films through antipyrine derivatives: a comprehensive study on UV resistance and degradation inhibition'. Together they form a unique fingerprint.

Cite this