Environmental and morphological behavior of polystyrene films containing Schiff base moiety

Mohammed H. Al-Mashhadani, Hamsa Thamer, Hadeel Adil, Ahmed Ahmed, Dina S. Ahmed, Muna Bufaroosha, Ali H. Jawad, Emad Yousif

Research output: Contribution to journalConference articlepeer-review

16 Citations (Scopus)


Herein novel Schiff base having triazole segment (3) has been synthesized and characterized. Different techniques have been used to evaluate the photo stability of the polystyrene polymeric films. It was demonstrated that mixing the polystyrene with synthesized Schiff base reduce the formation of carbonyl groups during the irradiation compare to the blank polystyrene film. The determination of weight loss was also studied and it was proved that using the Schiff base with the polymer films reduce the weight loss versus the irradiation time compare to the blank film. The energy-dispersive X-ray spectroscopy (EDX) technique shows that the major component of both Schiff base/polystyrene and blank polystyrene films is the carbon atom. However, it shows the appearance of new band for Schiff base/polystyrene film, related to the oxygen, nitrogen, and sulfur. The Schiff base/polystyrene film demonstrates the formation of terrestrial cracks-like and this might be due to the existence of the Schiff base, by using the scanning electron microscopy (SEM) technique. This work includes important results to reduce the threatening of plastic waste for marine ecosystem through using new photo stabilizers, which leads to decreasing of plastic consuming around the world.

Original languageEnglish
Pages (from-to)2693-2699
Number of pages7
JournalMaterials Today: Proceedings
Publication statusPublished - 2021
Event3rd International Conference on Materials Engineering and Science, IConMEAS 2020 - Kuala Lumpur, Malaysia
Duration: Dec 28 2020Dec 30 2020


  • Photo degradation
  • Polystyrene
  • Scanning electron microscopy
  • Schiff base
  • UV Irradiation

ASJC Scopus subject areas

  • General Materials Science


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