Evolution and Analysis of GaN GAA FET Induced High-K Spacer Wrapped Gate Underlap for Superfast Circuitry and RF Applications

Research output: Contribution to journalArticlepeer-review

Abstract

Gallium Nitride (GaN) Gate-All-Around (GAA) FETs are developed to be promising candidates for high-frequency, superfast circuitry and RF applications mainly due to their superior electron mobility and wide bandgap. A variety of GaN GAA FETs are developed incorporating gate underlap, spacer technology and source/drain engineering. A comprehensive analysis of DC and AC/RF performance parameters of high-k spacer-wrapped underlap-induced GaN GAA FETs with source and drain enlargements are attained. The impact of this spacer engineering on threshold voltage (Vth), drain-induced barrier lowering (DIBL), subthreshold swing (SS), ON-current (IOn), leakage current (IOff), and switching speed (IOn/IOff) are systematically evaluated. It is inevitably determined that integrating a high-K spacer substantially improves electrostatic control, thereby mitigates short-channel effects while achieve a near ideal SS of ~62 mV/decade. A refined underlap design with high-k wrapping effectively subdues fringing field effects by reducing parasitic capacitances and resistances acquiring cut-off frequency of ~7.2 THz, improves AC performances. The underlap region suppresses DIBL, maintaining excellent gate control while achieving a higher IOn/IOff ratio of ~ 19 × 108 instigating development of the novel device for superfast circuitry applications. The analysis is calibrated and validated with experimentally fabricated devices while Vth is analytically modelled. Comparison with existing research and proposed IRDS 2028 of 1.5 nm technology node shows the underlap-induced GaN GAA FET is advantageous, highlighting its effectiveness in reducing power dissipation, and enhancing switching performance. These findings confirm the design is well-suited for next-generation low-power, high-performance, superfast circuitry and RF applications offering superior energy efficiency and reliability in ultra-scaled transistor architectures.

Original languageEnglish
Pages (from-to)160221-160237
Number of pages17
JournalIEEE Access
Volume13
DOIs
Publication statusPublished - 2025

Keywords

  • GaN GAA FET
  • dc and ac performance
  • high-k underlap
  • nano-scaled transistor
  • superfast circuitry

ASJC Scopus subject areas

  • General Computer Science
  • General Materials Science
  • General Engineering

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