Production and assembly of atomic clusters

This paper describes the production of atomic clusters and their subsequent assembly into conducting films and wires on insulating substrates. An Ultra-High-Vacuum compatible Inert Gas Aggregation cluster deposition system which allows in-situ electrical measurements to be performed on deposited cluster films has been developed. Accurate placement and dimensional control of cluster-assembled films has been achieved in this system using soft-landed Bi and Sb clusters and templated substrates prepared using standard optical and electron-beam lithography. Self-contacting cluster-assembled films produced on planar Si _xN _y and SiO ₂ passivated Si substrates have provided a means to study conduction through percolating networks. Cluster-assembled wires with sub-100 nm widths have been positioned on templated Si _xN _y and SiO ₂ passivated Si substrates. The reported assembly techniques rely upon controlling cluster reflection from substrates and factors which affect the probability of cluster-reflection are discussed.