Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation

Ruqaya Raad, Mustafa Abdallh, Emad Yousif, Khalid Zainulabdeen, Ahmed Ahmed, Omar Al-Khazrajy, Muna Bofaroosha, Ali H. Jawad

Research output: Contribution to journalArticlepeer-review

Abstract

Surface functionalization of PMMA by Aminolysis reaction was utilised along with the addition of inorganic photo stabilisers (Zn(II), Ni(II), Cu(II) and Co(II)) to enhance the photostability of PMMA under exposure to UV light. The new polymers were characterised via different spectroscopic techniques. In order to assess the effectiveness of the PMMA films, Tinuvin 622, a commercial photo-stabiliser, was employed to assess the photostabilizing efficiency of our approach. The results have shown that Copper chloride was the most effective photostabilizer, followed by nickel, cobalt, and zinc chloride, in that order.

Original languageEnglish
Pages (from-to)511-520
Number of pages10
JournalMaterials Research Innovations
Volume27
Issue number7
DOIs
Publication statusPublished - 2023

Keywords

  • PMMA
  • PMMA modification
  • Photostabilizer
  • Sulphadiazine and photo-degradation

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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