Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation

Ruqaya Raad; Mustafa Abdallh; Emad Yousif; Khalid Zainulabdeen; Ahmed Ahmed; Omar Al-Khazrajy; Muna Bofaroosha; Ali H. Jawad

doi:10.1080/14328917.2023.2204572

Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation

Ruqaya Raad, Mustafa Abdallh, Emad Yousif, Khalid Zainulabdeen, Ahmed Ahmed, Omar Al-Khazrajy, Muna Bofaroosha, Ali H. Jawad

Department of Chemistry

Research output: Contribution to journal › Article › peer-review

Abstract

Surface functionalization of PMMA by Aminolysis reaction was utilised along with the addition of inorganic photo stabilisers (Zn(II), Ni(II), Cu(II) and Co(II)) to enhance the photostability of PMMA under exposure to UV light. The new polymers were characterised via different spectroscopic techniques. In order to assess the effectiveness of the PMMA films, Tinuvin 622, a commercial photo-stabiliser, was employed to assess the photostabilizing efficiency of our approach. The results have shown that Copper chloride was the most effective photostabilizer, followed by nickel, cobalt, and zinc chloride, in that order.

Original language	English
Journal	Materials Research Innovations
DOIs	https://doi.org/10.1080/14328917.2023.2204572
Publication status	Accepted/In press - 2023

Keywords

PMMA
PMMA modification
Photostabilizer
Sulphadiazine and photo-degradation

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1080/14328917.2023.2204572

Cite this

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title = "Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation",

abstract = "Surface functionalization of PMMA by Aminolysis reaction was utilised along with the addition of inorganic photo stabilisers (Zn(II), Ni(II), Cu(II) and Co(II)) to enhance the photostability of PMMA under exposure to UV light. The new polymers were characterised via different spectroscopic techniques. In order to assess the effectiveness of the PMMA films, Tinuvin 622, a commercial photo-stabiliser, was employed to assess the photostabilizing efficiency of our approach. The results have shown that Copper chloride was the most effective photostabilizer, followed by nickel, cobalt, and zinc chloride, in that order.",

keywords = "PMMA, PMMA modification, Photostabilizer, Sulphadiazine and photo-degradation",

author = "Ruqaya Raad and Mustafa Abdallh and Emad Yousif and Khalid Zainulabdeen and Ahmed Ahmed and Omar Al-Khazrajy and Muna Bofaroosha and Jawad, {Ali H.}",

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year = "2023",

doi = "10.1080/14328917.2023.2204572",

language = "English",

journal = "Materials Research Innovations",

issn = "1432-8917",

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TY - JOUR

T1 - Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation

AU - Raad, Ruqaya

AU - Abdallh, Mustafa

AU - Yousif, Emad

AU - Zainulabdeen, Khalid

AU - Ahmed, Ahmed

AU - Al-Khazrajy, Omar

AU - Bofaroosha, Muna

AU - Jawad, Ali H.

PY - 2023

Y1 - 2023

N2 - Surface functionalization of PMMA by Aminolysis reaction was utilised along with the addition of inorganic photo stabilisers (Zn(II), Ni(II), Cu(II) and Co(II)) to enhance the photostability of PMMA under exposure to UV light. The new polymers were characterised via different spectroscopic techniques. In order to assess the effectiveness of the PMMA films, Tinuvin 622, a commercial photo-stabiliser, was employed to assess the photostabilizing efficiency of our approach. The results have shown that Copper chloride was the most effective photostabilizer, followed by nickel, cobalt, and zinc chloride, in that order.

AB - Surface functionalization of PMMA by Aminolysis reaction was utilised along with the addition of inorganic photo stabilisers (Zn(II), Ni(II), Cu(II) and Co(II)) to enhance the photostability of PMMA under exposure to UV light. The new polymers were characterised via different spectroscopic techniques. In order to assess the effectiveness of the PMMA films, Tinuvin 622, a commercial photo-stabiliser, was employed to assess the photostabilizing efficiency of our approach. The results have shown that Copper chloride was the most effective photostabilizer, followed by nickel, cobalt, and zinc chloride, in that order.

KW - PMMA

KW - PMMA modification

KW - Photostabilizer

KW - Sulphadiazine and photo-degradation

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JF - Materials Research Innovations

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Surface modification of poly(methyl methacrylate)-sulphadiazine complexes as self photostabilizer against Ultraviolet (UV) Irradiation

Abstract

Keywords

ASJC Scopus subject areas

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