Tunable thin film integrated material characterizations for microwave applications

Mahmoud Al Ahmad; Sandrine Payan; Dominique Michau; Mario Maglione; Robert Plana

doi:10.1557/proc-1075-j02-07

Tunable thin film integrated material characterizations for microwave applications

Mahmoud Al Ahmad, Sandrine Payan, Dominique Michau, Mario Maglione, Robert Plana

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In this work, a simple, fast and repeatable technique is proposed for tunable integrated thin film material characterizations. The technique does not depend on the type of material development method or special thin film processing. Moreover, additional structures or calibrations are not required. The proposed method can be used to determine the loss of a thin film material using radio frequency capacitance measurements in both parallel plate and interdigital topologies. An analytical formulation is given for the computation of the film loss based on its measured input impedance which is extracted from the measured scattering parameters. This technique is used for barium strontium titanate (BST) thin film material characterizations.

Original language	English
Title of host publication	Passive and Electromechanical Materials and Integration
Publisher	Materials Research Society
Pages	114-120
Number of pages	7
ISBN (Print)	9781605608570
DOIs	https://doi.org/10.1557/proc-1075-j02-07
Publication status	Published - 2008
Externally published	Yes
Event	2008 MRS Spring Meeting - San Francisco, CA, United States Duration: Mar 24 2008 → Mar 28 2008

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	1075
ISSN (Print)	0272-9172

Other

Other	2008 MRS Spring Meeting
Country/Territory	United States
City	San Francisco, CA
Period	3/24/08 → 3/28/08

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1557/proc-1075-j02-07

Cite this

Tunable thin film integrated material characterizations for microwave applications. / Al Ahmad, Mahmoud; Payan, Sandrine; Michau, Dominique et al.
Passive and Electromechanical Materials and Integration. Materials Research Society, 2008. p. 114-120 (Materials Research Society Symposium Proceedings; Vol. 1075).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Al Ahmad, M, Payan, S, Michau, D, Maglione, M & Plana, R 2008, Tunable thin film integrated material characterizations for microwave applications. in Passive and Electromechanical Materials and Integration. Materials Research Society Symposium Proceedings, vol. 1075, Materials Research Society, pp. 114-120, 2008 MRS Spring Meeting, San Francisco, CA, United States, 3/24/08. https://doi.org/10.1557/proc-1075-j02-07

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abstract = "In this work, a simple, fast and repeatable technique is proposed for tunable integrated thin film material characterizations. The technique does not depend on the type of material development method or special thin film processing. Moreover, additional structures or calibrations are not required. The proposed method can be used to determine the loss of a thin film material using radio frequency capacitance measurements in both parallel plate and interdigital topologies. An analytical formulation is given for the computation of the film loss based on its measured input impedance which is extracted from the measured scattering parameters. This technique is used for barium strontium titanate (BST) thin film material characterizations.",

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N2 - In this work, a simple, fast and repeatable technique is proposed for tunable integrated thin film material characterizations. The technique does not depend on the type of material development method or special thin film processing. Moreover, additional structures or calibrations are not required. The proposed method can be used to determine the loss of a thin film material using radio frequency capacitance measurements in both parallel plate and interdigital topologies. An analytical formulation is given for the computation of the film loss based on its measured input impedance which is extracted from the measured scattering parameters. This technique is used for barium strontium titanate (BST) thin film material characterizations.

AB - In this work, a simple, fast and repeatable technique is proposed for tunable integrated thin film material characterizations. The technique does not depend on the type of material development method or special thin film processing. Moreover, additional structures or calibrations are not required. The proposed method can be used to determine the loss of a thin film material using radio frequency capacitance measurements in both parallel plate and interdigital topologies. An analytical formulation is given for the computation of the film loss based on its measured input impedance which is extracted from the measured scattering parameters. This technique is used for barium strontium titanate (BST) thin film material characterizations.

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Tunable thin film integrated material characterizations for microwave applications

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